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Registro Completo |
Biblioteca(s): |
Embrapa Instrumentação. |
Data corrente: |
13/09/2005 |
Data da última atualização: |
13/02/2012 |
Autoria: |
ASSIS, O. B. G.; ALVES, C. R. |
Título: |
Complementary analysis by atomic force microscopy of sol-gel films processed by dip-coating technique. |
Ano de publicação: |
2001 |
Fonte/Imprenta: |
Acta Microscopica, Maracaibo, v. 10, p. 153-156, apr. 2001. Supplement 1. First Latin American Symposium on Scanning Microscopy, São Pedro, SP, apr. 2001. |
Idioma: |
Inglês |
Conteúdo: |
The morphology and additional surface features of SiO2 films processed via sol-gel were evaluated by atomic force microscopy. Two sintering temperatures, 550 and 650 C were used for densification of gels deposited by dip-coating technique onto Ni plates. |
Palavras-Chave: |
Filmes Finos; sol-gel. |
Thesaurus Nal: |
silica gel. |
Categoria do assunto: |
-- |
Marc: |
LEADER 00846naa a2200169 a 4500 001 1029040 005 2012-02-13 008 2001 bl --- 0-- u #d 100 1 $aASSIS, O. B. G. 245 $aComplementary analysis by atomic force microscopy of sol-gel films processed by dip-coating technique. 260 $c2001 520 $aThe morphology and additional surface features of SiO2 films processed via sol-gel were evaluated by atomic force microscopy. Two sintering temperatures, 550 and 650 C were used for densification of gels deposited by dip-coating technique onto Ni plates. 650 $asilica gel 653 $aFilmes Finos 653 $asol-gel 700 1 $aALVES, C. R. 773 $tActa Microscopica, Maracaibo$gv. 10, p. 153-156, apr. 2001. Supplement 1. First Latin American Symposium on Scanning Microscopy, São Pedro, SP, apr. 2001.
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Embrapa Instrumentação (CNPDIA) |
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